STUDY OF DIAMOND ETCHING WITH Fe
 
                 
                
                    
                                        
                                        
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Abstract
    Using AES with ionsputtering, the carbonatomdist ribution near the diamondiron interface layer was studied in Fematrix after sintering for 6 min at 950℃. A formula of the carbon distribution was also founded. Simult aneously the process and mechanism of diamond etching with Fe were explained.
 
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